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STANDARD PLASMA SYSTEMS

 

[ MICROWAVE COUPLING 2.45 GHz FOR PLASMA APPLICATIONS]

   
 

Area of application:

  • Low-pressure plasma
   
  MICROWAVE COUPLING 2.45 GHz
 
 
  • HF power range up to 1,250 Watt depending on the magnetron in use, which can be selected from among several available power classes (300 W, 850 W and 1,200 W)
  • Intensity of the microwave plasma can be adjusted incrementally from the ignition point (min.) up to the upper power limits of the magnetron selected (max.)
  • Adjustable length of emitter in increments, depending on the recipients’ size
  • Preferably emitter diameter of 8 mm for a vitreous body diameter of 32 mm
  • Assemble the microwave coupling by a welded vacuum small flange KF 40 to the reverse side of the plasma chamber
  • Air cooling of the emitter is possible
  • Designed as a compact unit: magnetron – wave guide - emitter
  • Power supply by a controllable trademark switching power supply
    Supply voltage: 230 V +/- 10 % / 50 Hz:
    Power range 1 kW or 1.2 kW,
    Analogue control voltage: 0-10 V
  • Able to control the microwave couple by a plasma system PC


 
Plasmaanlage TETRA-30-LF mit vollautomatischer Steuerung. Konzipiert für die Produktion: Plasma Reinigung, Plasma Aktivierung, Plasma Ätzung - Plasma Cleaner

Microwave emitter with HF

Plasmaanlage TETRA-30-LF mit vollautomatischer Steuerung. Konzipiert für die Produktion: Plasma Reinigung, Plasma Aktivierung, Plasma Ätzung - Plasma Cleaner

Microwave emitter in the chamber

Strahler in Kammer
 

Microwave emitter in the chamber
Strahler ausgebaut 


Microwave emitter made without HF-generator
 
   
   
  Please contact us for details and questions you have.
   
   
   
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