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STANDARD PLASMA SYSTEMS

 

[ PLASMA SYSTEM FEMTO UHP - PLASMA ETCHER ]

   
  1,9 litres laboratory plasma system FEMTO UHP (Ultra High Purity) with semi-automatic control is mainly used for:
  • small scale production
  • analysis (SEM, TEM)
  • medical technology
  • sterilisation
  • research and development
  • semiconductor technology
  • plastic technology

UHP stands for Ultra High Purity. This designation is used for the glass chambers of our plasma systems, which can be, depending upon customer's request, made from Borosilicate glass or Quartz glass. The option of UHP is available only for the following units:
Femto, Pico und Nano.

Glass chambers are used in microwave systems and/or with applications where ultra pure surfacing is necessary.  Stainless steel or aluminum chambers can sputter in the smallest quantities, like all metals in a plasma system. For most processes this is not of importance and absolutely negligibly. The aluminum construction units from the UHP plant are coated with AL2O3.

The plasma system Pico UHP doesn't have a stainless steel chamber; thus, it is suitable for applications in which vestiges of chrome, nickel and iron are inconveniant.
  Prospekt FEMTO (PDF 1007 KB)
 


All plasma systems can be combined in the most diverse variations. The following overview is a help to get an overview of the most usual plasma systems.
   
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Technical Data:
Plasma etcher Femto UHP
(version 8)

switchgear cabinet:
W 345 mm, H 220 mm, D 420 mm
chamber:
Ø 95 mm, L 270 mm, Opening Ø 90 mm
materials:
quartz or borosilicate glass front-and backside of the chamber: aluminium chamber volume:
approx. 1,9 litre
gas supply:
one gas channel through needle valve
generator:
40kHz/100 W, infinitely variable
vacuum pump:
Leybold, Type S1.5 (1.5m³/h)
tray:

1 pc. tray
control:
semi-automatic control, process time
by timer

options / accessories



 
Femto UHP: Plasma cleaner, plasma asher, plasma activator

Plasma system FEMTO UHP(version 8): Process development, cleaning, activating, etching (small series)



Technical Data:
Plasma etcher Femto UHP
(version 9)

switchgear cabinet:
W 560 mm, H 310 mm, D 600 mm
chamber:
W 95 mm, L 270 mm, Opening Ø 90 mm
materials:
quartz or borosilicate glass front-and backside of the chamber: aluminium
chamber volume:
approx. 1,9 litre
gas supply:
one gas channel through needle valve
generator:
40kHz/100 W, infinitely variable
vacuum pump:
Leybold, Type S1.5 (1.5m³/h)
tray:

1 pc. tray
control:
semi-automatic control, process time
by timer

options / accessories



 
Femto UHP with door: Plasma cleaner, plasma asher, plasma activator

Plasma system FEMTO UHP (version 9): Process development, cleaning, activating, etching (with door)

Price on request
   
 

Technical Data:
Plasma etcher Femto UHP (version 10)

switchgear cabinet:
W 562 mm, H 211 mm, D 420 mm
chamber:
Ø 95 mm, L 270 mm,
Opening Ø 90 mm
materials:
quartz or borosilicate glass front-and backside of the chamber: aluminium
chamber volume:
approx. 1,9 litre
gas supply:
2 gas channel through needle valve
generator:
40kHz/100 W, infinitely variable
vacuum pump:
Leybold, Type S1.5 (1.5m³/h)
tray:

1 pc. tray
control:
semi-automatic control, process time
by timer
Pressure sensor:
Pirani

options / accessories



Plasmasystem FEMTO LF UHP  cleaning, etching, activating any surface

Plasma system FEMTO UHP (version 10) : Process development, cleaning, activating, etching (small series)
Price on request
 


 

Technical Data:
Plasma etcher Femto UHP (version 11)

switchgear cabinet:
W 562 mm, H 460 mm, D 550 mm
chamber:
Ø 95 mm, L 270 mm,
Opening Ø 90 mm
materials:
quartz or borosilicate glass front-and backside of the chamber: aluminium
chamber volume:
approx. 1,9 litre
gas supply:
3 gas channel through MFC
generator:
40kHz/0-100 W
(option: 13,56 MHz o. 2,45 GHz)
vacuum pump:
Leybold, Type S1.5 (1.5m³/h)
tray:

1 pc. tray
control:
PC control runs under Windows (To learn more about PC control, please refer to our pages.)

options / accessories

Plasmasystem FEMTO UHP with PC control cleaning, etching, activating any surface
Plasma system FEMTO-PC UHP (version 11) : Process development, cleaning, activating, etching (small series)
Price on request
 


 

Technical Data:
Plasma etcher Femto UHP (version 12)

switchgear cabinet:
W 320 mm, H 500 mm, D 420 mm
chamber:
W 95 mm, H 270 mm,
Opening Ø 95 mm
materials:
quartz or borosilicate glass front-and backside of the chamber: aluminium
chamber volume:
approx. 1,9 litre
gas supply:
2 gas channel through needle valve
generator:
40kHz/100 W, infinitely variable
vacuum pump:
Leybold, Type S1.5 (1.5m³/h)
tray:

1 pc. tray
control:
semi-automatic control, process time
by time or automatic
Pressure sensor:
Pirani

options / accessories



Plasmasystem FEMTO UHP V LF cleaning, etching, activating any surface

Plasma system FEMTO UHP (version 12) : Process development, cleaning, activating, etching (small series)
Price on request
 

The mentioned prices are without obligation
Please contact us if you have technical questions.

 

   
   
   
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