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PLASMA SYSTEMS

 

[ OPTIONS / ACCESSORIES FOR PLASMA SYSTEMS ]

   
 

The following accessories are available for the plasma systems:


  1. 13.56 MHz - generator
    To compliance DIN EN 55011, all our 13.56 MHz are quartz-stabilized. The impedance matching is fixed, manual or automatic possible.Main applications are activating, cleaning, etching, semi-conductor (front-end), semi-conductor (back-end) and plasmapolymerization.


  2. 13.56 Mhz generator for Plasma system, each Plasma system need its own generator, to make plasma process, modify Surface technology, optimize plasma treatment

  3. 40 kHz - generator
    The impedance matching is only automatic possible. The power is in two different sizes possible. Main applications are activation, cleaning, etching, semi-conductor (back-end), plasma polymerization.


  4. 40 mHz generator for Plasma system, each Plasma system need its own generator, to make plasma process, modify Surface technology, optimize plasma treatment


  5. 2.45 GHz - generator (Micro waven)
    The power is 0-300 Watt, the generator has pc connection. Main applications are activation, cleaning, etching, semi-conductor (front-end), semi-conductor (back-end), plasma polymerization.


  6. 2/2 way valve for liquid dosage
    Valve for selective dose of monomers.


  7. Semi-automatic control
    You find a detailed description of our different control variants on plasma systems/controls/semi automatic under the menu controls.



  8. semi-automatic control for Plasma system, each Plasma system need its own plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment

    please click on the picture.


  9. Fully automatic control
    You find a detailed description of our different control variants on plasma systems/controls/fully automatic under the menu controls.


  10. fully automatic control for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment

    please click on the picture.



  11. PC control
    You find a detailed description of our different control variants on plasma systems/controls/pc control under the menu controls.


  12. pc control for plasma system, each plasma system has its individual type, to create plasma process, surface technology, oprimize plasma activation.

    please click on the picture.


  13. PCCE control
    Based on Windows CE with touch panel. You find a detailed description of our different control variants on plasma systems/controls/pcce control under the menu controls.


  14. PCCE control for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment

    please click on the picture.


  15. Active Carbon filter
    Active carbon can be changed easily.

    Active carbon filter for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment



  16. Suction filter for vacuum


  17. Suction filter for vacuum for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment




  18. Automatic door


  19. Automatic door closed for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  20. Barcode reader


  21. Barcode reader for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  22. Heatable chamber
  23. The chamber can be heated up to 80°C. The temperature is adjustable. For defined process conditions and higher etching rates.


  24. Bias voltage measurement
    The bias voltage measurement is a measurement device and is available for kHz and MHz generators.


  25. Bubbler bottle
    Is a plasma polymerization equipment. For the connection of liquid monomers to the process vacuum chamber. Instead of the normal monomer bottle the bubbler bottle works with a carrier gas. The carrier gas f.e. argon will be flushed thorugh the monomer.


  26. Bubbler bottle for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment

  27. Butterfly valve


  28. Butterfly valve for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  29. Documentation in national language
    Documentation according to the machine rules 89/392/EWG. Does not apply for german and english language. This option has to be ordered, otherwise a documentation isn't attached.


  30. Rotary drum
    f.e. treatment of bulk materials.


  31. Rotary drum for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  32. Pressure gauge
    Pirani sensor or Baratron - pressure indication it the vacuum chamber.


  33. Pressure gauge for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatmentPiranisensor for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  34. Pressure reducer
    To connect to the process gas bottle - 200 bar. Different gases need different pressure reducers. Pressure reducer for noble gas like H2, O2, CF4, C4F8 und einen für NH3.


  35. Pressure reducer for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  36. Continous flow installations


  37. Spare parts set standard or PFPE
    The spare parts set standard and PFPE includes 1 pc. locking collar, 1 pc. seal, 1 pc. stainless steel corrugated tube (vacuum tube), 1 pc. window glass, 1 pc. door seal, 10 pcs. of micro fuses, and in the standard parts set 1 liter mineral oil for vacuum pump and for the PFPE set 1 liter PFPE- oil for the vacuum pump.


  38. Spare parts set for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  39. Label printer


  40. Label printer for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment

  41. Label reader


  42. Faraday Box
    For electrical sensitive parts. The parts that need to be treated are placed inside the box. It's possible to take the Faraday box out of the vacuum chamber.


  43. Faraday Box for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  44. Gas bottle holder
    Fastening to shelves or wall last at the work-table. The span width is 70 mm. The lashing strap safeguards without room to move. He is suitable for all bottle sizes.


  45. Gas bottle holder for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  46. Gas warning system (Dräger)


  47. Heating plate
    The parts that need to be treated are placed on the heating plate. The plate can be heated up to max. 150°C. For defined process conditions and higher etching rates.
    Fit out with temperature indicator, a tempreature sensor will be installed inside the vacuum chamber. The surface temperature can be measured during the process.
    Temperature indicator integrated in the PC control, a temperature sensor will be installed inside the vacuum chamber. The surface temperature can be measured during the process. The value of the temperature will be shown on the pc monitor.


  48. Heating plate for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  49. Installation of the plasma system/plasma cleaner/plasma etcher on site
    This option includes travel time, working time and travel costs.


  50. Ion current sensor


  51. Corrosive gas version
    Stainless steel valves and stainless steel tubing. System can work with corrosive gases like NH3, H2O, CF4, SF6.


  52. Custom designed tracks
    Our plasma systems will be delivered with one tray for standard. Further trays or other constructions can be produced ater consulting Diener electronic.


  53. Custom designed tracks for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  54. Lacquer spray / glass sheets set (LABS-free test)
    Equipment for processing LABS-test: Set includes: Lacquer spray in tins, 5 pieces each 400 ml, glass sheets, 100 pieces, each 90 mm x 110 mm.


  55. Lacquer spray for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  56. Slow ventilation of the vacuum chamber
    The vacuum chamber will be ventilated slowly by a filter. Spinning around of small parts in the chamber will be prevented.


  57. Slow pump down of the vacuum chamber
    The vacuum chamber will be pumped down by bypass valve. Spining around of small parts in the chamber will be prevented.


  58. Longer vacuum chamber (Femto, Pico, Nano, ...)
    Our systems have been measured (window pane) concerning irradiation according to DIN 12198. Result: inoxious. Vaccum chambers are available in stainless steel, borosilicate glass and quartz glass. The chamber cover, cap or hinged door, can be chosen. The length of the vacuum chamber depends on what a plasma cleaner you need. Please talk to us.


  59. Power display
    The display shows the power of the generator. It's a analog display.



  60. Power display for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  61. Floor electrode
    Can be delivered round or rectangular. More parts can be treated per process. Please consult Diener electronic regarding the exactly construction of your individual electrode as well as other materials for the manufacturing of your trays.


  62. Floor electrode for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  63. Microwave leak tester


  64. Monomer bottle
    Plasma poymerization equipment. For connection of liquid monomers to the process/vacuum chamber.


  65. Monomer bottle for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  66. Network connection


  67. OES - optical emission spectrometer
    Conrolling of plasma process for quality assurance. End point detection of plasma process. OES only together with a PC controlled system.


  68. Polymerization equipment
    Includes Verdampferflasche, eine Waage, Dosierpumpe, Heizung, evtl. Halterung


  69. Process gas bottle
    Oxygen-bottle as process gas in 2, 5 and 10 litres available. Hydrogen-bottle as process gas in 2 litres and Argon-bottle as process gas in 5 litres available. For delivery of gas-bottles please note that there are special transport conditions. If you want to rent a system you must buy the bottle.


  70. Quarz glass boat
    Available in two different dimensions. For ultra pure plasma processes and wafer treatment.


  71. Quart glass boat for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  72. RIE-electrode
    Available in round and rectangular, for upper etching rates. Application areas are anisotropic and isotropic etching.


  73. RIE electrode for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  74. RIE-electrode with gas shower
    Rectangular of stainless steel, upper etching rates because of a homogeneous gas distribution. Application area is anisotropic etching.


  75. RIE electrode with gas shower for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  76. Role to role system
    E.g. for treatment of foil / Lead-frames



  77. Role to role system for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  78. Oxygen generator
    Oxygen will be produced out of ambient air. Type: Kröber O2. Oxygen power: 3-6 l/min.


  79. Oxygen generator for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  80. Safety valve
    Safety valve for operations with Wasserstoff, Ethin ...


  81. Safety valve for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  82. Special electrodes and trays
    Our systems will be delivered with one tray for standard. Further trays or other constructions can be produced alfter consulting Diener electronic.


  83. Special electrodes and trays for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  84. Special flange / additional flange


  85. Special flange - additional flange for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  86. Special vacuum chamber
    Our systems have been measured (window pane) concerning irradiation according to DIN 12198. Result: inoxious. Special vacuum chambers are available round with cap, rectangular with hinged door, they are from aluminium and are different in inner diameter and opening diameter of recipient.


  87. Special vacuum chamber for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  88. Standard-electrode round or rectangular
    Of stainless steel/aluminium for standard plasma processes.


  89. TEM sample holder
    Special device for introducing from outside into the plasma chamber. Every size is practicable. Please tell us the your dimensions of your parts.


  90. TEM sample holder for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  91. Temperature indicator
    Temperature indicator for chamber temperature without heating plate. A temperature indicator will be installed inside the vacuum chamber. The surface temperature can be measured during the process. The temperature indicator is also available integraded in the PC control. The value of the temperature will be shown on the pc monitor.


  92. Temperature indicator for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  93. Test ink set
    Test inks for easy analysis of the surface energy. One set contains: 28, 38, 56, 64, 72, and 105 mN/m. Other values on request available.


  94. Test ink set for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  95. Thermal vaporiser
    For substances with low vapor pressure. Cup diameter: 16 mm, cup volume: 0,1 l. Screening against plasma effect, control of temperature (max. 500°C) and temperature rise rate (up to 250°C/min). Connection with small flange feedthrough.


  96. Timer LT4H
    For setting up the process time. Manufacturer: NAIS, type LT4H.


  97. Vacuum chamber of glas (borosilicate or quartz)
    Vacuum chamber of borosilicate glass are for pure plasma processes, vacuum chambers of quartz glass are for ultra pure plasma processes.


  98. Vacuum chamber aus Glas for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  99. Vacuum chambers of stainless steel
    Vacuum chambers of stainless steel are for standard plasma processes.


  100. Vacuum chamber for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  101. Vacuum pumps
    Rotary vane pumps or dry pumps with mineral or PFPE oil. Our pumps are available with mineral oil and PFPE oil also. The pumps will be delivered oil-filledly.


  102. Device for powder treatment
    Powder will be treated in a rotating glass bottle. For filling it is possible to take out the bottle of the chamber.


  103. Device for powder treatment for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  104. Quotation for maintenance
    Quotation for maintenance includes oil change, inspection of all connections, seals, connectors etc, leakage rate test, calibration of pressure sensor and functional test.


  105. Laundry bags
    For the preliminary purification of small parts in the washing machine. Diameter: 550 mm x 300 mm, minimum order quantity: 20 pieces.


  106. Laundry bags for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  107. Washing machine / Dryer
    For the preliminary purification of small parts before plasma treatment. Only neccessary for strong contaminated parts. Manufacturer Miele, Type: WT 2670 WPM.


  108. Water cooling system
    Because of the two chamge machine contacts for pump protection circuit the connection is free of potential.



  109. Water cooling system for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment


  110. Water cooled tray plate
    Water cooled tray plate will be installed on the bottom of the chamber. Including water pump and water tank. For cooling down of heat sensitive parts.


  111. Additional Software options
    The software can be modified with further options every time. Please specify your claims.


  112. Additional gas supply
    Needle valve: Our systems are available with any needle valves or Mass-Flow-Controllers (MFCs). Standard of plasma system type Femto are 1-3 pieces, more on request.


  113. Neelde valve for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment

  114. Additional MFCs
    MFCs: Needed for PC and PCCE control. Our plasma systems are available with any Mass-Flow-ConroUnsere Anlagen können mit beliebig vielen Mass-Flow-Controllern (MFCs) ausgestattet werden.


  115. MFC for Plasma system, each Plasma system need its own individual plasma accessories, to make plasma process, modify Surface technology, optimize plasma treatment

Most of these options / accessories can also be introduced after production.

 
   
   
   
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