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STANDARD PLASMA SYSTEMS

 

[ PLASMA SYSTEM FEMTO - PLASMA CLEANER ]

   
  2 litres laboratory plasma system FEMTO with semi-automatic control is mainly used for:
  • small scale production
  • analysis (SEM, TEM)
  • medical technology
  • sterilisation
  • research and development
  • archaeology
  • textile treatment
  • semiconductor technology
  • plastic technology

  Brochure FEMTO (PDF 1007 KB)
 


All plasma systems can be combined in the most diverse variations. The following overview is a help to get an overview of the most usual plasma systems.
   
 

Technical Data:
Plasma cleaner Femto timer (version 1)

switchgear cabinet:
W 345 mm, H 220 mm, D 420 mm
chamber:
Ø 100 mm, L 270 mm
chamber volume:
approx. 2 litre
gas supply:
one gas channel through needle valve
generator:
40kHz/100 W, infinitely variable
vacuum pump:
Leybold, Type S1.5 (1.5m³/h)
tray:

1 pc. tray
control:
semi-automatic control, process time
by timer

options / accessories



 
Plasmaanlage FEMTO für Prozessentwicklung, Reinigung, Aktivierung, Ätzung in Kleinserie - Plasmasysteme
Plasma system FEMTO timer (version 1): Process development, cleaning, activating, etching (small series)

Technical Data:
Plasma cleaner Femto PCCE
(version 2)

switchgear cabinet:
W 562 mm, H 211 mm, D 420 mm
chamber:
Ø 100 mm, L 280 mm
chamber volume:
ca. 2,8 litre
gas supply:
2 pcs. gas channel through MFC
generator:
40kHz/100W, infinitely
vacuum pump:
Leybold, Typ S1,5 (1,5m³/h)
tray:

1 pc. tray
control:
PC control

Optionen / Zubehör



 
Plasmaanlage FEMTO PCCE für Prozessentwicklung, Reinigung, Aktivierung, Ätzung in Kleinserie - Plasmasysteme

Plasma system FEMTO PCCE (version 2) :
Process development, cleaning, activating, etching
(small series)

PRICE on request

Veraltete LCD-Anzeige, Innovativer Touchscreen
Old LCD-display Innovative touchscreen


Techncal Data:
Plasma cleaner Femto
(version 3)

switchgear cabinet :
W 345 mm, H 220 mm, D 420 mm
chamber:
Ø 100 mm, L 270 mm
chamber volume:
ca. 2 litre
gas supply:
1 gas supply through needle valve
generator:
13,56 MHz/50W, infinitely
vacuum pump:
Leybold, Typ S1,5 (1,5m³/h)
tray:

1 pc. tray
control:
manual, process time by timer

options / accessories



 
Plasmaanlage FEMTO für Prozessentwicklung, Reinigung, Aktivierung, Ätzung in Kleinserie - Plasmasysteme

Plasma system FEMTO (version 3) :
Process development, cleaning, activating, etching
(small series)

PRICE on request

Technical Data:
Plasma cleaner Femto
(version 4)

switchgear cabinet:
W 560 mm, H 310 mm, D 600 mm
chamber:
W 100 mm, H 100 mm, D 280 mm
chamber volume:
approx. 2 litre
gas supply:
one gas channel through needle valve
generator:
40kHz/100 W, infinitely variable
vacuum pump:
Leybold, Type S1.5 (1.5m³/h)
tray:

1 pc. tray
control:
semi-automatic control, process time
by timer

options / accessories



 
Femto with door: Plasma cleaner, plasma asher, plasma activator

Plasma system FEMTO (version 4):
Process development, cleaning, activating, etching (with door)

Price on request
   
 

Technical Data:
Plasma cleaner Femto
(version 5)

switchgear cabinet:
W 562 mm, H 211 mm, D 420 mm
chamber:
Ø 100 mm, L 270 mm
chamber volume:
approx. 2 litre
gas supply:
2 gas channel through needle valve
generator:
40kHz/100 W, infinitely variable
vacuum pump:
Leybold, Type S1.5 (1.5m³/h)
tray:

1 pc. tray
control:
semi-automatic control, process time
by timer
Pressure sensor:
Pirani

options / accessories



Plasmasystem FEMTO LF cleaning, etching, activating any surface

Plasma system FEMTO (version 5) :
Process development, cleaning, activating, etching (small series)
Price on request
 


 

Technical Data:
Plasma cleaner Femto
(version 6)

switchgear cabinet:
W 562 mm, H 460 mm, D 550 mm
chamber:
Ø 100 mm, L 270 mm
chamber volume:
approx. 2 litre
gas supply:
3 gas channel through MFC
generator:
40kHz/0-100 W
(option: 13,56 MHz o. 2,45 GHz)
vacuum pump:
Leybold, Type S1.5 (1.5m³/h)
tray:

1 pc. tray
control:
PC control runs under Windows (To learn more about PC control, please refer to our pages.)

options / accessories

Plasmasystem FEMTO with PC control cleaning, etching, activating any surface
Plasma system FEMTO-PC (version 6) :
Process development, cleaning, activating, etching (small series)
Price on request
   
 

Technical Data:
Plasma cleaner Femto
(version 7)

switchgear cabinet:
W 320 mm, H 500 mm, D 420 mm
chamber:
W 100 mm, H 270 mm, D 280 mm
chamber volume:
approx. 2 litre
gas supply:
2 gas channel through needle valve
generator:
40kHz/100 W, infinitely variable
vacuum pump:
Leybold, Type S1.5 (1.5m³/h)
tray:

1 pc. tray
control:
semi-automatic control, process time
by time or automatic
Pressure sensor:
Pirani

options / accessories



Plasmasystem FEMTO V LF cleaning, etching, activating any surface

Plasma system FEMTO (version 7) : Process development, cleaning, activating, etching (small series)
Price on request
 

The mentioned prices are without obligation
Please contact us if you have technical questions.

 

   
   
   
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