diener electronic : CVD


	CVD Chemical Vapour Deposition, coating process involving the deposition of alayer by decomposition of a gaseous compound (e. g. deposition of a metalby thermal decomposition of a volatile compound of the metal). CVDprocesses can be supported (PECVD = Plasma Enhanced CVD) or started(PACVD = Plasma Activated CVD) by plasma. Important applications of CVDprocesses are layers of amorphous carbon or silicon as well as titaniumnitride, titanium carbide and silicon nitride layers.

	首頁 \| 電漿技術 \| 專業術語 \| 常見問題 \| 電漿系統 \| 連結/地區代理商 \| 滿意客戶 \| 下載圖片 \| 巡迴展覽 \| 保持連絡 \| 如何前往 \| 簡介

	© 2007 Diener electronic North America